Figure RS.2.1.  
													Top view of fixed-fixed beam 
													used to measure residual 
													strain.
													To 
													obtain the following 
													measurements, consult ASTM 
													standard test method E 2245 
													entitled
															"Standard Test 
													Method for Residual Strain 
													Measurements of Thin, 
													Reflecting Films
															Using an Optical 
													Interferometer" and NISTIR 
													7291 entitled "MEMS Length 
													and Strain 
Round Robin 
													Results with Uncertainty 
													Analysis."
													
													
													date data taken (optional) = 
				
             / 
				
             / 
				
													identifying words (optional)   
													=    
												
													instrument used (optional)   
													=    
												
													fabrication facility/process 
													(optional)   =    
												
													test chip name 
													(optional)   =    
												
													
													test chip number 
													(optional)   =    
												
													
													filename of 3-D data set 
													(optional)   =    
													
														filename of 2-D data 
													traces (optional) = 
													
													     
													
													
													     
													
													
													 
												
													
												
													
														                                           
													 
													 
												
													
													     
													     
													            
													
													
													
												
													 
													
													
												
													                     
														
													
												
													
													                                       
													
													
															OUTPUTS 
													(calibrated values): 
														            x1ave 
													=  
													μm            
													x2ave 
													=  
													μm
														             
													L      
													=  
													μm
														                        
                                            Lmax = ( x2max
                                            − 
													x1max
                                            		) calx
															                         
													Lmin = ( 
													x2min
                                            − 
													x1min
                                            		) calx
													                         
													uLL  =  
													( Lmax  
													−
                                            Lmin
                                            		) / 6 =  
                                            		μm
														                        
                                            uLxcal  = (
                                            σxcal / interx 
													) ( L / calx 
													) = 
                                            		μm
															                         
													uLxres  = 
													xres 
													calx
													/ 1.732 = 
                                            		μm
															             
													ucL   
													=
                                             SQRT[uLL2
                                            		+ uLxcal2
                                            + 
													uLxres2] 
                                            		= 
                                            
                                            		μm
														             
													s        
													=               
													from Trace "c"
													
													                         
													s = 1       
													(for downward bending 
													fixed-fixed beams)
														                         
													s =
                                            −1     
													(for upward bending 
													fixed-fixed beams)
													
													    
													                         
													AF   =  
													μm      from Trace "b"
															    
													                       
													w1F   =  
													           from 
													Trace "b"
															                             
													AS   
													=  
													μm      
													from Trace "b"
															                           
													w3S   =  
													            
													from Trace "b"
														             
													xeF   =  
													μm            
													from Trace "b"
															             
													xeS   =  
													μm            
													from Trace "b"
															            
													εr0    
													=  
													× 10-6       
													from Trace "b"
															            
													εr     
													=   
													 × 10-6       
													from Trace "b"
													    
													                         
													AF   =  
													μm      from Trace "c"
															    
													                       
													w1F   =  
													           from Trace "c"
															                             
													AS   
													=  
													μm      
													from Trace "c"
															                           
													w3S   =  
													            
													from Trace "c"
														             
													xeF   =  
													μm             
													from Trace "c"
															             
													xeS   =  
													μm             
													from Trace "c"
															             
													εr0   =   
													× 10-6        from 
													Trace "c"
														             
													
													εr  
													  =   
													
													 × 10-6        from 
													Trace "c"                
													(USE THIS VALUE)
														
                                            		                         
													uRave    =   
													 × 10-6      from 
													Trace "c"
																                         
													unoise    =   
													 × 10-6      from 
													Trace "c"
																                         
													uW    =   
													 × 10-6          
													from two or three traces
															                        
                                            uxcal    =   
                                             × 10-6        from 
													Trace "c"
															                         uL  
													  =   
													 × 10-6           
													from Trace "c"
															                        
                                            ucert    =   
                                             × 10-6        from 
													Trace "c"
																                         
													urepeat(shs)    =   
													 × 10-6        from 
													Trace "c"
																                         
													udrift    =   
													 × 10-6        from 
													Trace "c"
																                         
													ulinear    =   
													 × 10-6        from 
													Trace "c"
																                         
													uzres    =   
													 × 10-6        from 
													Trace "c"
																                         
													uxres    =   
													 × 10-6        from 
													Trace "c"
																                         
													uxresL    =   
													 × 10-6        from 
													Trace "c"
																             
													ucer  = SQRT[uRave2
                                            		+ unoise2
                                            		+ uW2
                                            		+ uxcal2
                                            + 
													uL2
                                            		+ ucert2
                                            + 
													urepeat(shs)2
                                            + 
													udrift2
                                            + 
													ulinear2
                                            + 
													uzres2
                                            + 
													uxres2
                                            + 
													uxresL2]
															
													                        
													(Each of the standard 
													uncertainty components is 
													obtained using a Type B 
													analysis.)
															            
                                             ucer  
													=   
													
													 × 10-6        from 
													two or three traces
													    
													                         
													AF   =  
													μm      from Trace "d"
															    
													                       
													w1F   =   
													           from 
													Trace "d"
															                             
													AS   
													=  
													μm      
													from Trace "d"
															                           
													w3S   =  
													            
													from Trace "d"
														             
													xeF   =   
													μm             
													from Trace "d"
															             
													xeS   =  
													μm             
													from Trace "d"
															           
                                            εr0    
													=  
													× 10-6        
													from Trace "d"
															            
													εr     
													=   
													 × 10-6        from 
													Trace "d"
													
													Report the results as 
													follows:  Since it can be assumed that the 
													estimated values of the 
													uncertainty 
													components are
													approximately uniformly 
													or Gaussianly distributed with 
													approximate combined standard 
													
uncertainty
			ucer, the residual strain is believed to lie in the 
													interval 
													er 
													± 
													
			ucer 
													(expansion factor k=1) 
													representing a level of 
													confidence of approximately 
													68 %. 
													
													
													
												Modify the 
													input data, given the 
													information supplied in any 
													flagged statement below, if 
													applicable, then 
													recalculate:
													
														| 1. |  | Please 
													fill out the entire form. | 
													
														| 2. |  | The 
													value for t 
													should be between 0.000 μm 
													and 10.000 
													μm. | 
													
														| 3. |  | The value for the design 
														length should be 
														between 0  
														μm 
														and 1000 
														μm. | 
													
														| 4. |  | The 
													measured value for L 
													is more than 3ucL 
													from the design length. | 
													
														| 5. |  | The 
													value for the design width 
													should be between 0  
														μm 
													and 60
													 
														μm. | 
													
														| 6. |  | Is the magnification 
														appropriate given the 
														design length ? | 
													
														| 7. |  | Magnifications at or 
														less than 
														2.5× shall not be used. | 
													
														| 8. |  | Is 0.95 < calx < 
														1.05 but not equal to 
														"1"?  If not, 
														recheck your x-calibration. | 
													
														| 9. |  | The value for 
														interx should be 
														between 0  
														μm 
														and 1500 
														μm. | 
													
														| 10. |  | The value for 
														 
												 σxcal 
														should be between 0  
														μm 
														and 4 
														μm. | 
													
														| 11. |  | The value for 
														xres 
														should be between 0  
														μm 
														and 2.00 
														μm. | 
													
														| 12. |  | Is 0.95 
													< calz < 1.05 but not 
													equal to "1"?  If not, 
													recheck your z-calibration. | 
													
														| 13. |  | The 
													value for cert 
													should be greater than 0 μm 
													and less than 25 μm. | 
													
														| 14. |  | The 
													value for 
												 σcert 
													should be between 0 μm and 
													0.100 μm. | 
													
														| 15. |  | The 
													value for 
													zrepeat(shs) 
													should be between 0 μm and 
													0.070 μm. | 
													
														| 16. |  | The 
													value for 
													zdrift 
													should be between 0 μm and 
													0.010 μm. | 
													
														| 17. |  | The 
													value for 
													zperc 
													should be between 0 % and 3 
													%. | 
													
														| 18. |  | The 
													value for zres 
													should be greater than 0 μm 
													and less than or equal to 
													0.005 μm. | 
													
														| 19. |  | The 
													value for 
													Rtave should 
													be between 0  
													μm 
													and 0.100 
													μm and greater than Rave. | 
													
														| 20. |  | The value for 
														Rave 
														should be between 0  
														μm 
														and 0.020 
														μm. | 
													
														| 21. |  | Alignment has not been 
														ensured. | 
													
														| 22. |  | Data has not been 
														leveled. | 
													
														| 23. |  | x1min should 
													be greater than x1max. | 
													
														| 24. |  | x2min 
													should be greater than x1min. | 
													
														| 25. |  | x2max 
														should be greater than 
														x2min. | 
													
														| 26. |  | The 
													calibrated values for 
													x1min and 
													x1max are 
													greater than 10 μm apart. | 
													
														| 27. |  | The 
													calibrated values for 
													x2min and 
													x2max are 
													greater than 10 μm apart. | 
													
														| 28. |  | In 
													Traces "b," "c," and "d," 
													the value for s is 
													not the same. | 
													
														| 29. |  | x1ave 
													should be < (x1F 
													calx) in all 
													traces. | 
													
														| 30. |  | (x3S 
													
													calx) should be < 
													x2ave in all 
													traces. | 
													
														| 31. |  | In all 
													traces, make sure ( x1F 
													< x2F < 
													x3F ). | 
													
														| 32. |  | In all 
													traces, make sure ( x1S 
													< x2S < 
													x3S ). | 
													
														| 33. |  | For 
													Trace "b," | [(x2F calx) 
													− xeF ] | 
													= 
													μm.  This should 
													be < 5 μm. If it is not, choose (x2F,
                                            z2F) 
													such that (x2F 
													calx) is closer to 
													xeF 
													= 
                                            		μm.
 | 
													
														| 34. |  | For Trace "b," | [(x2S calx) 
														− 
														xeS ] | 
														= 
														μm.  This 
														should be < 5 μm. If it is not, choose (x2S,
                                            z2S) 
														such that (x2S
														 calx) 
														is closer to xeS 
														= 
                                            			μm.
 | 
													
														| 35. |  | For Trace "c," | [(x2F calx) 
														− xeF 
														] | = 
														μm.  This 
														should be < 5 μm. If it is not, choose (x2F,
                                            z2F) 
														such that (x2F 
														calx) is closer 
														to 
														xeF
											 = 
                                            μm.
 | 
													
														| 36. |  | For Trace "c," | [(x2S calx) 
														− 
														xeS ] | 
														= 
														μm.  This 
														should be < 5 μm. If it is not, choose (x2S,
                                            z2S) 
														such that (x2S 
														calx) is closer 
														to 
														xeS
											 = 
                                            μm.
 | 
													
														| 37. |  | For Trace "d," | [(x2F calx) 
														− xeF 
														] | = 
														μm.  This 
														should be < 5 μm. If it is not, choose (x2F,
                                            z2F) 
														such that (x2F
														 calx) 
														is closer to xeF
                                             = 
														μm.
 | 
													
														| 38. |  | For Trace "d," | 
											[(x2S calx) 
											− xeS 
														] | = 
														μm.  This 
														should be < 5 μm. If it is not, choose (x2S,
                                            z2S) 
											such that (x2S 
														calx) is closer 
											to 
														xeS 
														= 
                                            			μm.
 | 
												
												
														
													
													
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													Main MEMS Calculator Page.
													Email 
													questions or comments to
													
													[email protected].
													
													
													
												NIST is an agency of the 
												
												U.S. Commerce Department.
														
												The 
												
												Semiconductor and Dimensional 
												Metrology 
												Division is within the 
												
												Physical Measurement Laboratory.
															The 
												
												MEMS Measurement Science and 
												Standards Project 
												is within the 
												
												Nanoscale Metrology Group.
													
													
													
													Date created: 12/4/2000
														Last updated: 4/26/2013