Figure RS.2.1.
Top view of fixed-fixed beam
used to measure residual
strain.
To
obtain the following
measurements, consult ASTM
standard test method E 2245
entitled
"Standard Test
Method for Residual Strain
Measurements of Thin,
Reflecting Films
Using an Optical
Interferometer" and NISTIR
7291 entitled "MEMS Length
and Strain
Round Robin
Results with Uncertainty
Analysis."
date data taken (optional) =
/
/
identifying words (optional)
=
instrument used (optional)
=
fabrication facility/process
(optional) =
test chip name
(optional) =
test chip number
(optional) =
filename of 3-D data set
(optional) =
filename of 2-D data
traces (optional) =
OUTPUTS
(calibrated values):
x1ave
=
μm
x2ave
=
μm
L
=
μm
Lmax = ( x2max
−
x1max
) calx
Lmin = (
x2min
−
x1min
) calx
uLL =
( Lmax
−
Lmin
) / 6 =
μm
uLxcal = (
σxcal / interx
) ( L / calx
) =
μm
uLxres =
xres
calx
/ 1.732 =
μm
ucL
=
SQRT[uLL2
+ uLxcal2
+
uLxres2]
=
μm
s
=
from Trace "c"
s = 1
(for downward bending
fixed-fixed beams)
s =
−1
(for upward bending
fixed-fixed beams)
AF =
μm from Trace "b"
w1F =
from
Trace "b"
AS
=
μm
from Trace "b"
w3S =
from Trace "b"
xeF =
μm
from Trace "b"
xeS =
μm
from Trace "b"
εr0
=
× 10-6
from Trace "b"
εr
=
× 10-6
from Trace "b"
AF =
μm from Trace "c"
w1F =
from Trace "c"
AS
=
μm
from Trace "c"
w3S =
from Trace "c"
xeF =
μm
from Trace "c"
xeS =
μm
from Trace "c"
εr0 =
× 10-6 from
Trace "c"
εr
=
× 10-6 from
Trace "c"
(USE THIS VALUE)
uRave =
× 10-6 from
Trace "c"
unoise =
× 10-6 from
Trace "c"
uW =
× 10-6
from two or three traces
uxcal =
× 10-6 from
Trace "c"
uL
=
× 10-6
from Trace "c"
ucert =
× 10-6 from
Trace "c"
urepeat(shs) =
× 10-6 from
Trace "c"
udrift =
× 10-6 from
Trace "c"
ulinear =
× 10-6 from
Trace "c"
uzres =
× 10-6 from
Trace "c"
uxres =
× 10-6 from
Trace "c"
uxresL =
× 10-6 from
Trace "c"
ucer = SQRT[uRave2
+ unoise2
+ uW2
+ uxcal2
+
uL2
+ ucert2
+
urepeat(shs)2
+
udrift2
+
ulinear2
+
uzres2
+
uxres2
+
uxresL2]
(Each of the standard
uncertainty components is
obtained using a Type B
analysis.)
ucer
=
× 10-6 from
two or three traces
AF =
μm from Trace "d"
w1F =
from
Trace "d"
AS
=
μm
from Trace "d"
w3S =
from Trace "d"
xeF =
μm
from Trace "d"
xeS =
μm
from Trace "d"
εr0
=
× 10-6
from Trace "d"
εr
=
× 10-6 from
Trace "d"
Report the results as
follows: Since it can be assumed that the
estimated values of the
uncertainty
components are
approximately uniformly
or Gaussianly distributed with
approximate combined standard
uncertainty
ucer, the residual strain is believed to lie in the
interval
er
±
ucer
(expansion factor k=1)
representing a level of
confidence of approximately
68 %.
Modify the
input data, given the
information supplied in any
flagged statement below, if
applicable, then
recalculate:
1. |
|
Please
fill out the entire form. |
2. |
|
The
value for t
should be between 0.000 μm
and 10.000
μm. |
3. |
|
The value for the design
length should be
between 0
μm
and 1000
μm. |
4. |
|
The
measured value for L
is more than 3ucL
from the design length. |
5. |
|
The
value for the design width
should be between 0
μm
and 60
μm. |
6.
|
|
Is the magnification
appropriate given the
design length ? |
7. |
|
Magnifications at or
less than
2.5× shall not be used. |
8. |
|
Is 0.95 < calx <
1.05 but not equal to
"1"? If not,
recheck your x-calibration. |
9. |
|
The value for
interx should be
between 0
μm
and 1500
μm. |
10. |
|
The value for
σxcal
should be between 0
μm
and 4
μm. |
11.
|
|
The value for
xres
should be between 0
μm
and 2.00
μm. |
12. |
|
Is 0.95
< calz < 1.05 but not
equal to "1"? If not,
recheck your z-calibration. |
13. |
|
The
value for cert
should be greater than 0 μm
and less than 25 μm. |
14.
|
|
The
value for
σcert
should be between 0 μm and
0.100 μm. |
15.
|
|
The
value for
zrepeat(shs)
should be between 0 μm and
0.070 μm. |
16. |
|
The
value for
zdrift
should be between 0 μm and
0.010 μm. |
17. |
|
The
value for
zperc
should be between 0 % and 3
%. |
18. |
|
The
value for zres
should be greater than 0 μm
and less than or equal to
0.005 μm. |
19. |
|
The
value for
Rtave should
be between 0
μm
and 0.100
μm and greater than Rave. |
20. |
|
The value for
Rave
should be between 0
μm
and 0.020
μm. |
21. |
|
Alignment has not been
ensured. |
22. |
|
Data has not been
leveled. |
23. |
|
x1min should
be greater than x1max. |
24. |
|
x2min
should be greater than x1min. |
25. |
|
x2max
should be greater than
x2min. |
26. |
|
The
calibrated values for
x1min and
x1max are
greater than 10 μm apart. |
27. |
|
The
calibrated values for
x2min and
x2max are
greater than 10 μm apart. |
28. |
|
In
Traces "b," "c," and "d,"
the value for s is
not the same. |
29. |
|
x1ave
should be < (x1F
calx) in all
traces. |
30. |
|
(x3S
calx) should be <
x2ave in all
traces. |
31. |
|
In all
traces, make sure ( x1F
< x2F <
x3F ). |
32. |
|
In all
traces, make sure ( x1S
< x2S <
x3S ). |
33. |
|
For
Trace "b," | [(x2F calx)
− xeF ] |
=
μm. This should
be < 5 μm.
If it is not, choose (x2F,
z2F)
such that (x2F
calx) is closer to
xeF
=
μm. |
34. |
|
For Trace "b," | [(x2S calx)
−
xeS ] |
=
μm. This
should be < 5 μm.
If it is not, choose (x2S,
z2S)
such that (x2S
calx)
is closer to xeS
=
μm. |
35. |
|
For Trace "c," | [(x2F calx)
− xeF
] | =
μm. This
should be < 5 μm.
If it is not, choose (x2F,
z2F)
such that (x2F
calx) is closer
to
xeF
=
μm. |
36. |
|
For Trace "c," | [(x2S calx)
−
xeS ] |
=
μm. This
should be < 5 μm.
If it is not, choose (x2S,
z2S)
such that (x2S
calx) is closer
to
xeS
=
μm. |
37. |
|
For Trace "d," | [(x2F calx)
− xeF
] | =
μm. This
should be < 5 μm.
If it is not, choose (x2F,
z2F)
such that (x2F
calx)
is closer to xeF
=
μm. |
38. |
|
For Trace "d," |
[(x2S calx)
− xeS
] | =
μm. This
should be < 5 μm.
If it is not, choose (x2S,
z2S)
such that (x2S
calx) is closer
to
xeS
=
μm.
|
Return to
Main MEMS Calculator Page.
Email
questions or comments to
mems-support@nist.gov.
NIST is an agency of the
U.S. Commerce Department.
The
Semiconductor and Dimensional
Metrology
Division is within the
Physical Measurement Laboratory.
The
MEMS Measurement Science and
Standards Project
is within the
Nanoscale Metrology Group.
Date created: 12/4/2000
Last updated: 4/26/2013